Our Products
Discover the invisible,
as your journey from micro to nano unfolds with SEMIAN.
제품소개
Features
Safety
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Semian Osmium Coater prioritizes safety through its innovative design, ensuring efficiency in osmium management, continuous gas monitoring, dual-chamber for the combustion of unreacted gases, and a user-centric automated design. It offers outstanding safety features.
High Performance
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Through its "Flash Mode," Semian Osmium Coater minimizes the release of unreacted osmium gas, reduces osmium consumption, and minimizes condensation, delivering high-performance results.
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Equipped with dual valves for precise osmium gas control, it guarantees high-quality images for SEM or TEM.
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Even when resuming operations after a prolonged period of non-use, there is no need for additional ampule discharge pre-treatment.
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It also includes built-in pre-treatment for sample decontamination and oxide film removal, along with a Glow Discharging function for TEM observation.
Advanced
Coating Method:
Chemical Vapor
Deposition(CVD)
Our utilization of the Chemical Vapor Deposition (CVD) method, which
involves coating in a vapor diffusion state, ensures coatings are applied
uniformly on porous and complex sample structures.
Osmium coating is applied in a diffusive state, making it possible to achieve uniform coating on porous and complex sample structures, which is otherwise impossible with sputter ion coaters. Its amorphous nature ensures clean imaging up to high magnifications. Additionally, it offers the advantage of minimal damage even during prolonged electron beam exposure
This approach consistently delivers reliable results, making it an ideal choice for a wide range of coating requirements.
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SEMIAN OS Coating without crystallization phenomenon
In the process of supplying Osmium Gas using "SEMIAN Flash Mode"(0.5 sec Flash, 3 times, thickness - 5nm), the resulting coated image shows uniform Osmium film formation at x100k magnification, with no observable Osmium particles. This indicates that the Flash method, which minimizes harmful gas emissions and prevents crystallization, yields favorable results.
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OS Coating with crystallization phenomenon
When Osmium Gas is supplied using generic "Time Mode" (continuous 10 seconds, thickness - 6nm), the resulting coated image shows uniform Osmium film formation at x100k magnification, but Osmium crystallization is observed. This phenomenon occurs when a substantial amount of Osmium gas is supplied to samples with poor adsorption characteristics.
Innovative design prioritizing
user safety.
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Effective removal of residual osmium through the auxiliary chamber.
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Automatic gas presence detection within the main chamber, alerting the user when it's time to replace the Os ampoule.
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Gas leak detection and warning notifications within the main chamber.
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Designed ampoule cartridge allows users to introduce it into the chamber without direct contact with hazardous osmium. Additionally, it is easily detachable for convenient cleaning.
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Fume System and
Sample Auto Handling System
SOC-12F
Comprehensive Gas Leak Prevention
Experience the perfect harmony of safety and convenience through Semian SOC-12F. This system maintains continuous negative pressure by consistently drawing external air into the case to prevent harmful gas leaks.
Sample Auto Handling System
The Fume Sample Auto Loading/Unloading System is the safest and most convenient solution for users. This automated system allows for the exchange of samples without the need to open the fume case while maintaining negative pressure to prevent gas leaks. Upon pressing the sample exchange button, the main chamber automatically rises, and the sample tray moves towards the user by opening the fume case. After placing the sample, the sample tray is automatically reinserted into the chamber, initiating the vacuum and coating process automatically. Throughout the entire process, user exposure to residual substances within the chamber is minimized.
Specifications
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Ultimate Vacuum: 2.0*10-2mbar
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Working Vacuum: 8.0*10-2~5.0*10-1 mbar
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Vacuum Measurment: Pirani Gauge
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FTM unit: 0.1nm
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Max Current: 30mA
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Product Dimensions: 510 * 525 * 555 mm
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Weight: 20 kg
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Chamber Size: Ø 120 x 115 mm
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OS gas Leak Prevention Device and Method *Patented (제 10-2096523호)
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Ion Sputter Sample Auto Handling System *Patented (제 10-2289120호)