Our Products
Discover the invisible,
as your journey from micro to nano unfolds with SEMIAN.
제품소개
All Model
Features
Electron Microscope Analysis Solution
Triple Target Control System
Equipped with three specialized targets optimized for electron microscopy - Pt for conventional SEM imaging, Cr for high-resolution FE-SEM observation, and C for EDS/WDX/EBSD analysis - this system enables seamless switching between different analytical modes without target exchange, dramatically improving efficiency in microscopy workflow.
Multi-Layer Structure Formation
Multi-Layer Coating Through Single Process
Create multi-layer structures of metal/oxide, magnetic/non-magnetic materials through continu-ous
processes. Optimized for development of next-generation electronic devices requiring precise
multi-layer structure control.
Compositional Gradient Control System
Solution for Next-Generation Materials Development
Precise control of individual target deposition rates enables fabrication of gradient films with continuously varying compositions. This capability allows for high throughput screening of diverse material properties in a single process, dramatically improving the efficiency of new materials research.
Triple Options, Triple Layers.
One Complete Solution
T1
Our system, equipped with 3 target sputtering, enables various applications according to your research purpose. Pt, Cr, C targets can be selectively used for each application, from SEM analysis to complex multilayer fabrication, meeting researchers’ diverse needs.
*Various metal targets can be accommodated for different applications
T2
T3
Triple Target System
Pt (Platinum):
Widely used for normal SEM observation at magnifications below 100,000x
Cr (Chromium)
For FE-SEM high-resolution
imaging at magnifications
above 100,000x
C (Carbon)
Minimizes X-ray signal inter-ference for EDS, WDX, EBSD
analysis, enabling accurate
elemental analysis
+
SMC-20TS
Tilt-Rotation Option
Precise Angle Control System
Optimized Multi-Layer Coating Through Angle Control
The 70° tilt rotation stage is optimized for both
sample handling and micro-structure coating control
Application Fields
· Semiconductor 3D Structures
· Micro-electronic Devices
· Battery Electrode Materials
· Multiple-angle Analysis Samples
· MEMS Applications
+
SMC-20TS
Planetary-Rotation Option
Large Area Uniform Coating System
Large Area Coating Through Simultaneous Sputtering
The planetary rotation system enables large area
coating for 4-inch wafers. Uniform film formation is
possible up to 100mm diameter through the planetary
rotation mechanism.
Application Fields
· Advanced display technology
(OLED, LCD, touchscreen panels)
· Energy storage devices with thin-film electrodes
· Optical components
· Semiconductor devices
· Precision optical lens coating systems
